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Processing issues of interferometric type MEMS reflective display
- Authors
- Park, H.-C.; Oh, J.-H.; Kim, Y.-S.
- Issue Date
- 2010
- Citation
- Proceedings of International Meeting on Information Display, pp.96 - 97
- Start Page
- 96
- End Page
- 97
- ISSN
- 1738-7558
- Abstract
- In this study, we investigated the processing issues involved in manufacturing interferometric type MEMS reflective displays. The issues include number of masks used, cracks in mechanical membrane, and uniformity of the device. The results demonstrated that the masks can be reduced significantly by using back-exposure process and the other issues can be solved with modification of processing parameters.
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