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Heterogeneous crystallization of amorphous silicon expedited by external force fields: a molecular dynamics study

Authors
Park, SHKim, HJLee, DBLee, JSChoi, YKKwon, OM
Issue Date
Mar-2004
Publisher
ACADEMIC PRESS LTD ELSEVIER SCIENCE LTD
Keywords
Tersoff potential; Voronoi analysis; external field enhanced crystallization; crystallization of amorphous silicon
Citation
SUPERLATTICES AND MICROSTRUCTURES, v.35, no.3-6, pp.205 - 215
Journal Title
SUPERLATTICES AND MICROSTRUCTURES
Volume
35
Number
3-6
Start Page
205
End Page
215
URI
https://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/25785
DOI
10.1016/j.spmi.2003.10.002
ISSN
0749-6036
Abstract
Applying a molecular dynamics simulation technique with the Tersoff potential, we investigate the isothermal crystallization processes of amorphous silicon (a-Si). To obtain a realistic amorphous structure, a rapid quenching process from liquid-phase at 3500 K to solid-phase at 500 K is simulated at a rate of 10(12)K/s and the Voronoi analysis is conducted to observe atomic structural changes during this cooling process. This amorphous structure is utilized to simulate the crystallization processes at various process temperatures with and without external force fields. While homogeneous crystallization of a-Si could not be achieved readily, it is shown that the heterogeneous crystallization can be significantly accelerated by external force fields. This enhancement is owing to increased molecular jumping frequencies associated with the molecular potential energies being increased by external excitations, rather than due to thermal mechanisms normally found in conventional solidphase crystallization processes. (C) 2004 Elsevier Ltd. All rights reserved.
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College of Engineering > Materials Science and Engineering Major > 1. Journal Articles
College of Engineering > Department of Mechanical and System Design Engineering > 1. Journal Articles

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