Effects of substrate temperature on the magnetic properties of As-sputtered FeTaN films
- Authors
- Bae, S; Kim, CS; Jeong, JH; Ryu, SR; Kim, HJ; Nam, SE; Kim, HJ
- Issue Date
- Jul-2001
- Publisher
- IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
- Keywords
- FeTaN; soft magnetism; substrate heating
- Citation
- IEEE TRANSACTIONS ON MAGNETICS, v.37, no.4, pp.2291 - 2293
- Journal Title
- IEEE TRANSACTIONS ON MAGNETICS
- Volume
- 37
- Number
- 4
- Start Page
- 2291
- End Page
- 2293
- URI
- https://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/27206
- DOI
- 10.1109/20.951151
- ISSN
- 0018-9464
- Abstract
- We investigated the magnetic properties of as-sputtered FeTaN films as a function of deposition temperature and composition. At the deposition temperature higher than 200 degreesC, both soft magnetism and magnetic moments can be fully achieved. While the Th and N contents in the films affect the magnetic properties, the N content exhibits stronger effects. The magnetic properties are affected by the film microstructures via. crystallinity, grain size, and formation of FexN phases. An excessive N incorporation into the films causes incomplete crystallization and/or formation of Fe3N phases in the as-deposited state, leading to a poor soft magnetic property. As-deposited FeTaN film at the optimum composition of Fe91.7Ta4.2N4.1 gives the best soft magnetic properties; coercivity of similar to2 Oe and permeability of similar to 1600 stable up to the frequency of 100 MHz.
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Collections - College of Engineering > Materials Science and Engineering Major > 1. Journal Articles
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