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Dopant Activation of Ion Shower Doped Poly-Si Using Induction Annealing

Authors
노재상
Issue Date
29-Nov-2018
Publisher
International Journal of Emerging Technology and Advanced Engineering
Citation
International Journal of Emerging Technology and Advanced Engineering , v.8, no.11, pp.24 - 26
Journal Title
International Journal of Emerging Technology and Advanced Engineering
Volume
8
Number
11
Start Page
24
End Page
26
URI
https://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/2884
Abstract
Abstract? We report a novel method of activation annealing, named as induction annealing (IA). IA was realized by applying alternating electric field induced by alternating magnetic filed applied to the sample. We observed the enhanced kinetics of dopant activation by using IA.
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