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Effect of oxidants on atomic layer deposition of Al2O3: A DFT study

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dc.contributor.author송봉근-
dc.date.available2020-07-10T04:21:42Z-
dc.date.created2020-07-08-
dc.date.issued2018-08-22-
dc.identifier.urihttps://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/3321-
dc.language영어-
dc.language.isoen-
dc.publisherInternational Union of Materials Research Societies-
dc.titleEffect of oxidants on atomic layer deposition of Al2O3: A DFT study-
dc.typeArticle-
dc.contributor.affiliatedAuthor송봉근-
dc.identifier.bibliographicCitationIUMRS-ICEM 2018, v.0, no.0, pp.0 - 0-
dc.relation.isPartOfIUMRS-ICEM 2018-
dc.citation.titleIUMRS-ICEM 2018-
dc.citation.volume0-
dc.citation.number0-
dc.citation.startPage0-
dc.citation.endPage0-
dc.type.rimsART-
dc.description.journalClass1-
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