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Tungsten Thin Film Grown by Plasma-Enhanced Atomic Layer Deposition Using Fluorine Free Precursor
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 송봉근 | - |
| dc.date.available | 2020-07-10T04:30:20Z | - |
| dc.date.created | 2020-07-08 | - |
| dc.date.issued | 2018-02-14 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/4005 | - |
| dc.language | 영어 | - |
| dc.language.iso | en | - |
| dc.publisher | 반도체학술대회 | - |
| dc.title | Tungsten Thin Film Grown by Plasma-Enhanced Atomic Layer Deposition Using Fluorine Free Precursor | - |
| dc.type | Article | - |
| dc.contributor.affiliatedAuthor | 송봉근 | - |
| dc.identifier.bibliographicCitation | 반도체학술대회, v.반도체학술대회, no.-, pp.0 - 0 | - |
| dc.relation.isPartOf | 반도체학술대회 | - |
| dc.citation.title | 반도체학술대회 | - |
| dc.citation.volume | 반도체학술대회 | - |
| dc.citation.number | - | - |
| dc.citation.startPage | 0 | - |
| dc.citation.endPage | 0 | - |
| dc.type.rims | ART | - |
| dc.description.journalClass | 2 | - |
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Related Researcher
- Shong, Bong geun
- Engineering (Chemical Engineering)