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Results 1-1 of 1 (Search time: 0.005 seconds).
Fluorination of TiN, TiO2, and SiO2 Surfaces by HF toward Selective Atomic Layer Etching (ALE)
open access
Jung, J.H.; Oh, H.;
Shong, B.
Article
Issue Date
2023
Citation
Coatings, v.13, no.2
Publisher
MDPI
1
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Subject
ADSORPTION
1
CHEMISTRY
1
computational chemistry
1
DEPOSITION
1
DIFFUSION
1
etching
1
fluorination
1
MECHANISM
1
RUTHENIUM
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silicon dioxide
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Date Issued
2023
1
Language
English
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