Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Etching characteristics of high-purity aluminum in hydrochloric acid solutions
- Authors
- Oh, Han-Jun; Lee, Jong-Ho; Ahn, Hong-Joo; Jeong, Yongsoo; Park, No-Jin; Kim, Seong-Su; Chi, Choong-Soo
- Issue Date
- 25-Mar-2007
- Publisher
- ELSEVIER SCIENCE SA
- Keywords
- etch tunnel; capacitance; impedance spectroscopy; aluminum electrolytic capacitors
- Citation
- MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, v.449, pp 348 - 351
- Pages
- 4
- Journal Title
- MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
- Volume
- 449
- Start Page
- 348
- End Page
- 351
- ISSN
- 0921-5093
1873-4936
- Abstract
- We investigated the effects of additives to the etching solution of I M hydrochloric acid on the electrochemical etching behavior for aluminum electrolytic capacitors, using scanning and transmission electron microscopy, and AC impedance spectroscopy. For the addition of I M sulfuric acid or 5% ethylene glycol to the hydrochloric acid solution, the distribution of etch tunnels was more uniform with high density of etch pits compared with that without addition. The highest specific surface area was obtained from the electrolyte with 5% ethylene glycol additive. The correlation of internal morphologies of etched foils with impedance parameters was interpreted by impedance techniques. (c) 2006 Elsevier B.V. All rights reserved.
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - Department of Materials Science and Engineering > 1. Journal Articles
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.