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회전식 화학증착 장치 내부의 유동해석을 통한 최적 유량 평가COMPUTATIONAL ASSESSEMENT OF OPTIMAL FLOW RATE FOR STABLE FLOW IN A VERTICAL ROTATING DISk CHEMICAL VAPOR DEPOSITION REACTOR

Other Titles
COMPUTATIONAL ASSESSEMENT OF OPTIMAL FLOW RATE FOR STABLE FLOW IN A VERTICAL ROTATING DISk CHEMICAL VAPOR DEPOSITION REACTOR
Authors
곽호상
Issue Date
2012
Publisher
한국전산유체공학회
Keywords
화학증착(CVD; Chemical Vapor Deposition); 회전원판(Rotating Disc); 최적 유량(Optimal Flow Rate); 유동 안정성(Flow Stability); 플러그 유동(Plug Flow); 부력구동유동(Buoyancy-Induced Flow)
Citation
한국전산유체공학회지, v.17, no.1, pp 86 - 93
Pages
8
Journal Title
한국전산유체공학회지
Volume
17
Number
1
Start Page
86
End Page
93
URI
https://scholarworks.bwise.kr/kumoh/handle/2020.sw.kumoh/23173
ISSN
1598-6071
Abstract
A numerical investigation is conducted to search for the optimal flow rate for a rotating-disk chemical vapor decomposition reactor operating at a high temperature and a low pressure. The flow of a gas mixture supplied into the reactor is modeled by a laminar flow of an ideal gas obeying the kinetic theory. The axisymmetric two-dimensional flow in the reactor is simulated by employing a CFD package FLUENT. With operating pressure and temperature fixed, numerical computations are performed by varying rotation rate and flow rate. Examination of the structures of flow and thermal fields leads to a flow regime diagram illustrating that there are a stable plug-like flow regime and a few unfavorable flow regimes induced by mass unbalance or buoyancy. The criterion for sustaining a plug-like flow regime is discussed based on a theoretical scaling argument. Interpretation of the flow regime map suggests that a favorable flow is attainable with a minimum flow rate at the smallest rotation rate guaranteeing the dominance of rotation effects over buoyancy.
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