회전원판형 CVD 장치의 유동 재순환을 억제하는출구부 형상 설계를 위한 전산해석A COMPUTATIONAL ANALYSIS FOR OUTLET SHAPE DESIGN TO SUPPRESS FLOW RECIRCULATION IN A ROTATING-DISK CVD REACTOR
- Other Titles
- A COMPUTATIONAL ANALYSIS FOR OUTLET SHAPE DESIGN TO SUPPRESS FLOW RECIRCULATION IN A ROTATING-DISK CVD REACTOR
- Authors
- 박장진; 김경진; 곽호상
- Issue Date
- 2013
- Publisher
- 한국전산유체공학회
- Keywords
- 배기부 형상설계(Outlet Shape Design); 화학증착(CVD; Chemical Vapor Deposition); 회전원판(Rotating Disc); 유동 재순환(Flow Recirculation); 출구부 측벽경사각(Angle of Outlet Sidewall); 유동 안정성(Flow Stability)
- Citation
- 한국전산유체공학회지, v.18, no.4, pp 74 - 81
- Pages
- 8
- Journal Title
- 한국전산유체공학회지
- Volume
- 18
- Number
- 4
- Start Page
- 74
- End Page
- 81
- URI
- https://scholarworks.bwise.kr/kumoh/handle/2020.sw.kumoh/23313
- DOI
- 10.6112/kscfe.2013.18.4.074
- ISSN
- 1598-6071
- Abstract
- A numerical design analysis is conducted to search for an optimal shape of outlet in a rotating-disk CVD reactor. The goal is to suppress flow recirculation that has been found in a reactor having a sudden expansion of flow passage outside of the rotating disk. In order to streamline gas flow, the sidewall at which the flow in the Ekman layer is impinged, is tilted. The axisymmetric laminar flow and heat transfer in the reactor are simulated using the incompressible ideal gas model. For the conventional vertical sidewall, the flow recirculation forming in the corner region could be expanded into the interior to distort the upstream flow. The numerical results show that this unfavorable phenomenon inducing back flow could be dramatically suppressed by tilting the sidewall at a certain range of angle. The assessment of deviation in deposition rate based on the characteristic isotherm illustrates that the sidewall tilting may expand the domain of stable plug-like flow regime toward higher pressure. A physical interpretation is attempted to explain the mechanism to suppress flow recirculation.
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Collections - School of Mechanical System Engineering > 1. Journal Articles
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