A Novel Analysis of L-gd Dependent-1/f Noise in In0.08Al0.92N/GaN

Abstract

In0.08Al0.92N/GaN fin-type high-electron mobility transistors (fin-HEMTs) with different gate-to-drain lengths (L-gd) are fabricated and characterized by dc and low-frequency noise (LFN) measurements. The fabricated device with the largest L-gd exhibits the degradation of the maximum drain current and transconductance with a positive shift of the threshold voltage. LFN measurements of the In0.08Al0.92N/GaN fin-HEMTs reveal clear 1/f behavior of the noise spectra, and the minimum value is observed in the device at L-gd = 20 mu m. The devices with smaller L-gd follow a carrier number fluctuation noise model owing to electron trapping/detrapping into the In0.08Al0.92N barrier layer from the 2-D electron gas (2DEG) channel. In contrast, the device with the largest L-gd shows correlated mobility fluctuations due to the large 2DEG mobility fluctuations in the large access area.