Light-emitting properties of photo-curable polyfluorene derivatives
- Authors
- Park, Moo-Jin; Lee, Jeong-Ik; Chu, Hye-Yong; Kim, Seong-Hyun; Zyung, Taehyoung; Eom, Jae-Hoon; Shim, Hong-Ku; Hwang, Do-Hoon
- Issue Date
- Jul-2009
- Publisher
- ELSEVIER SCIENCE SA
- Keywords
- Polyfluorene derivative; Blue light-emitting; Photo-patterning
- Citation
- SYNTHETIC METALS, v.159, no.14, pp 1393 - 1397
- Pages
- 5
- Journal Title
- SYNTHETIC METALS
- Volume
- 159
- Number
- 14
- Start Page
- 1393
- End Page
- 1397
- URI
- https://scholarworks.bwise.kr/kumoh/handle/2020.sw.kumoh/27308
- DOI
- 10.1016/j.synthmet.2009.03.027
- ISSN
- 0379-6779
- Abstract
- An alternating copolymer composed of bis-(4-octyloxyphenyl)fluorene and bis((3-hexyloxy-3'-ethyl)oxetane) fluorene [poly(PF-alt-OXTF)], and a terpolymer composed of the above two monomers with N-hexylphenotiazine [poly(PF-co-OXTF-co-PTZ)] have been synthesized by Suzuki coupling polymerization. The synthesized poly(PF-alt-OXTF) and poly(PF-co-OXTF-co-PTZ) films became insoluble after UV irradiation in the presence of a proper photo-acid generator. The UV-vis absorption and PL emission spectra of the polymers before and after photo-cross-link reaction were almost same. The EL devices were constructed with ITO/PEDOT:PSS/polymer/LiF/Al configuration. The EL devices using the photo-cross-linked polymer films also showed lower operating voltages than the devices using the corresponding polymer films without cross-link. Moreover, the EL device of the poly(PF-co-OXTF-co-PTZ) film with photo-cross-link showed better device performances than the device without cross-link, and the maximum brightness and power efficiency of the device were 4750 cd/m(2) and 0.68 cd/A, respectively. Furthermore, we obtained a well-patterned thin film with poly(PF-co-OXTF-co-PTZ) after a successive lithographic process. (C) 2009 Elsevier B.V. All rights reserved.
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - ETC > 1. Journal Articles
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.