열 나노임프린트 공정에서 가압조건이패턴전사에 미치는 영향Effects of Pressurization Conditions on the Pattern Transfer in the Thermal Nanoimprint Lithography
- Other Titles
- Effects of Pressurization Conditions on the Pattern Transfer in the Thermal Nanoimprint Lithography
- Authors
- 김국원; 이우영; 이기연
- Issue Date
- 2013
- Publisher
- 한국반도체디스플레이기술학회
- Keywords
- Pressurization Conditions; Residual Layer Thickness; Thermal Nanoimprint Lithography; Transferred Pattern
- Citation
- 반도체디스플레이기술학회지, v.12, no.4, pp.15 - 20
- Journal Title
- 반도체디스플레이기술학회지
- Volume
- 12
- Number
- 4
- Start Page
- 15
- End Page
- 20
- URI
- https://scholarworks.bwise.kr/sch/handle/2021.sw.sch/14102
- ISSN
- 1738-2270
- Abstract
- Nanoimprint lithography (NIL) is the next generation photolithography process in which the photoresist is dispensed onto the substrate in its liquid form and then imprinted and cured into a desired pattern instead of using traditional optical system. There have been considerable attentions on NIL due to its potential abilities that enable cost-effective and high-throughput nanofabrication to the display device and semiconductor industry. In this paper, a pressure vessel type imprinting system was used to imprint patterns with two type pressure values (25 bar, 30 bar) and two type pressure keeping times (5 min, 10 min). The height of transferred pattern and the thickness of residual layer were measured and effects of pressurization conditions - pressure and pressure keeping time - on the pattern transfer in thermal NIL were investigated.
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