화학양면성의 전해이온수를 이용한 극자외선 마스크의 나노세정Nano-cleaning of EUV mask using amphoterically electrolyzed ion water
- Other Titles
- Nano-cleaning of EUV mask using amphoterically electrolyzed ion water
- Authors
- 유근걸; 정윤원; 최인식; 김형원; 최병선
- Issue Date
- 2021
- Publisher
- 한국반도체디스플레이기술학회
- Keywords
- extreme ultraviolet (EUV); mask cleaning; amphoteric; electrolyzed ion water; wet cleaning; nano particle; MoSi; photoresist; Sn; hydrocarbon deposition
- Citation
- 반도체디스플레이기술학회지, v.20, no.2, pp.34 - 42
- Journal Title
- 반도체디스플레이기술학회지
- Volume
- 20
- Number
- 2
- Start Page
- 34
- End Page
- 42
- URI
- https://scholarworks.bwise.kr/sch/handle/2021.sw.sch/19156
- ISSN
- 1738-2270
- Abstract
- Recent cleaning technologies of mask in extremely ultraviolet semiconductor processes were reviewed, focused on newly developed issues such as particle size determination or hydrocarbon and tin contaminations. In detail, critical particle size was defined and proposed for mask cleaning where nanosized particles and its various shapes would result in surface atomic ratio increase vigorously. A new cleaning model also was proposed with amphoteric behavior of electrolytically ionized water which had already shown excellent particle removing efficiency. Having its non-equilibrium and amphoteric properties, electrolyzed ion water seemed to oxidize contaminant surface selectively in nano-scale and then to lift up oxidized ones from mask surface very effectively. This assumption should be further investigated in future in junction with hydrogen bonding and cluster of water molecules.
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