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OLED deposition characteristics for 4th generation mass-production

Kim, C.W.[Kim, C.W.]; Kwon, H.G.[Kwon, H.G.]; Rho, J.S.[Rho, J.S.]; Yoon, J.S.[Yoon, J.S.]; Bae, K.B.[Bae, K.B.]; Jeong, C.H.[Jeong, C.H.]; Yeom, G.Y.[Yeom, G.Y.]

ArticleIssue Date2006CitationDigest of Technical Papers - SID International Symposium, v.37, no.1, pp.432 - 435

SCIESCOPUS

On the Etching Characteristics and Mechanisms of HfO2 Thin Films in CF4/O-2/Ar and CHF3/O-2/Ar Plasma for Nano-Devices

Lim, N[Lim, Nomin]; Efremov, A[Efremov, Alexander]; Yeom, GY[Yeom, Geun Young]; Kwon, KH[Kwon, Kwang-Ho]

ArticleIssue Date2014CitationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.14, no.12, pp.9670 - 9679

SCIESCOPUS

On the LPCVD-Formed SiO2 Etching Mechanism in CF4/Ar/O-2 Inductively Coupled Plasmas: Effects of Gas Mixing Ratios and Gas Pressure

Son, J[Son, Jinyoung]; Efremov, A[Efremov, Alexander]; Chun, I[Chun, Inwoo]; Yeom, GY[Yeom, Geun Young]; Kwon, KH[Kwon, Kwang-Ho]

ArticleIssue Date2014CitationPLASMA CHEMISTRY AND PLASMA PROCESSING, v.34, no.2, pp.239 - 257PublisherSPRINGER

SCIESCOPUS

Optoelectronic Characteristics of Organic Light-Emitting Diodes with a Rb2CO3-Mixed C-60 Layer as an Electron Ohmic-Contact

Lim, JT[Lim, Jong Tae]; Park, JW[Park, Jin Woo]; Kwon, JW[Kwon, Jae Wook]; Yeom, GY[Yeom, Geun Young]; Lhm, K[Lhm, Kyuwook]; Lee, KJ[Lee, Kyoung Jae]

ArticleIssue Date2013CitationJOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.160, no.1, pp.G1 - G5PublisherELECTROCHEMICAL SOC INC

SCIESCOPUS

Orientation dependence of the fracture behavior of graphene

Jhon, YI[Jhon, Young I.]; Jhon, YM[Jhon, Young Min]; Yeom, GY[Yeom, Geun Y.]; Jhon, MS[Jhon, Myung S.]

ArticleIssue Date2014CitationCARBON, v.66, pp.619 - 628PublisherPERGAMON-ELSEVIER SCIENCE LTD

SCIESCOPUS

Orientation dependence of the fracture behavior of graphene (vol 66, pg 619, 2014)

Jhon, YI[Jhon, Young I.]; Jhon, YM[Jhon, Young Min]; Yeom, GY[Yeom, Geun Y.]; Jhon, MS[Jhon, Myung S.]

ArticleIssue Date2014CitationCARBON, v.72, pp.431 - 431PublisherPERGAMON-ELSEVIER SCIENCE LTD

SCIESCOPUS

Origin of operating voltage increase in deep UV light-emitting diodes with ITO/Al reflector

Sung, YJ[Sung, Youn Joon]; Kim, DW[Kim, Dong-Woo]; Yeom, GY[Yeom, Geun Young]; Kim, KS[Kim, Kyu Sang]

ArticleIssue Date2021CitationJAPANESE JOURNAL OF APPLIED PHYSICS, v.60, no.11PublisherIOP Publishing Ltd

SCIESCOPUS

Perfluoropolyether Lubricant Interactions With Novel Overcoat via Coarse-Grained Molecular Dynamics

Vemuri, SH[Vemuri, Sesha Hari]; Chung, PS[Chung, Pil Seung]; Smith, R[Smith, Robert]; Yeom, GY[Yeom, Geun-Young]; Jhon, YI[Jhon, Young In]; Lee, NE[Lee, Nae-Eung]; Biegler, LT[Biegler, Lorenz T.]; Jhon, MS[Jhon, Myung S.]

ArticleIssue Date2012CitationIEEE TRANSACTIONS ON MAGNETICS, v.48, no.11, pp.4277 - 4280PublisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC

SCIESCOPUS

Performance of vertical type deep UV light-emitting diodes depending on the Ga-face n-contact hole density

Sung, Y.J.[Sung, Y.J.]; Kim, D.-W.[Kim, D.-W.]; Yeom, G.Y.[Yeom, G.Y.]; Kim, K.S.[Kim, K.S.]

ArticleIssue Date2021CitationAPPLIED PHYSICS LETTERS, v.118, no.23PublisherAmerican Institute of Physics Inc.

SCIESCOPUS

Photocatalytic Effect of Ag/TiO2 Nanotubes Fabricated Using 40 nm-Scale BCP Lithography

Sung, D.I.[Sung, D.I.]; Kim, H.G.[ Kim, H.G.]; Cha, S.K.[ Cha, S.K.]; Kim, D.H.[ Kim, D.H.]; Lee, H-B.-R.[ Lee, H-B.-R.]; Kim, S.O.[ Kim, S.O.]; Kim, D.W.[Kim, D.W.]; Yeom, G.Y.[Yeom, G.Y.]

ArticleIssue Date2017CitationNANOSCIENCE AND NANOTECHNOLOGY LETTERS, v.9, no.1, pp.50 - 55PublisherAMER SCIENTIFIC PUBLISHERS

SCIESCOPUS

Photoresist ashing technology using N-2/O-2 ferrite-core ICP in the dual damascene process

Kim, HW[Kim, Hyoun Woo]; Myung, JH[Myung, Ju Hyun]; Lee, JW[Lee, Jong Woo]; Kim, HS[Kim, Hyung-Sun]; Kim, K[Kim, Keeho]; Jang, JY[Jang, Jeong-Yeol]; Yoon, TH[Yoon, Tae-Ho]; Kim, SK[Kim, Sung Kyeong]; Choi, DK[Choi, Dae-Kyu]; Chung, CW[Chung, Chin-Wook], et al.

ArticleIssue Date2006CitationJOURNAL OF MATERIALS SCIENCE, v.41, no.15, pp.5040 - 5042PublisherSPRINGER

SCIESCOPUS

Plasma and antenna characteristics of a linearly extended inductively coupled plasma system using multi-polar magnetic field

Kim, KN[Kim, Kyong Nam]; Lim, JH[Lim, Jong Hyeuk]; Yeom, GY[Yeom, Geun Young]

ArticleIssue Date2007CitationTHIN SOLID FILMS, v.515, no.12, pp.5193 - 5196PublisherELSEVIER SCIENCE SA

SCIESCOPUSKCI

Plasma and electrical characteristics of a novel internal linear inductively coupled plasma source for flat panel display applications

Kim, KN[Kim, KN]; Yeom, GY[Yeom, GY]

ArticleIssue Date2006CitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.48, no.3, pp.422 - 426PublisherKOREAN PHYSICAL SOC

Plasma and electrical characteristics of a novel internal linear inductively coupled plasma source for flat panel display applications

Kim, K.N.[Kim, K.N.]; Yeom, G.Y.[Yeom, G.Y.]

ArticleIssue Date2006CitationJournal of the Korean Physical Society, v.48, no.3, pp.422 - 426

SCIESCOPUS

Plasma characteristics and antenna electrical characteristics of an internal linear inductively coupled plasma source with a multi-polar magnetic field

Kim, KN[Kim, Kyong Nam]; Lim, JH[Lim, Jong Hyeuk]; Park, JK[Park, Jung Kyun]; Yeom, GY[Yeom, Geun Young]; Lee, SH[Lee, Sung Hee]; Lee, JK[Lee, Jae Koo]

ArticleIssue Date2008CitationPLASMA CHEMISTRY AND PLASMA PROCESSING, v.28, no.1, pp.147 - 158PublisherSPRINGER

SCIESCOPUS

Plasma Characteristics of 450 mm Diameter Ferrite-Enhanced Inductively Coupled Plasma Source

Hong, SP[Hong, Seung Pyo]; Lim, JH[Lim, Jong Hyeuk]; Gweon, GH[Gweon, Gwang Ho]; Yeom, GY[Yeom, Geun Young]

ArticleIssue Date2010CitationJAPANESE JOURNAL OF APPLIED PHYSICS, v.49, no.8PublisherJAPAN SOC APPLIED PHYSICS

SCIESCOPUS

Plasma Characteristics of a Ni-Zn Ferrite Enhanced Internal-Type Inductively Coupled Plasma Source Operated at 2 and 13.56 MHz

Kim, KN[Kim, Kyong Nam]; Lim, JH[Lim, Jong Hyeuk]; Yeom, GY[Yeom, Geun Young]

ArticleIssue Date2010CitationPLASMA CHEMISTRY AND PLASMA PROCESSING, v.30, no.1, pp.183 - 190PublisherSPRINGER

SCIESCOPUS

Plasma Characteristics of Inductively Coupled Plasma Using Dual-Frequency Antennas

Kim, TH[Kim, Tae Hyung]; Kim, KN[Kim, Kyong Nam]; Mishra, AK[Mishra, Anurag Kumar]; Seo, JS[Seo, Jin Seok]; Jeong, HB[Jeong, Ho Boem]; Bae, JO[Bae, Jung Oun]; Yeom, GY[Yeom, Geun Young]

ArticleIssue Date2013CitationJAPANESE JOURNAL OF APPLIED PHYSICS, v.52, no.5PublisherJAPAN SOC APPLIED PHYSICS

SCIESCOPUS

Plasma Characteristics of Internal Inductively Coupled Plasma Source with Ferrite Module

Lim, JH[Lim, Jong Hyeuk]; Kim, KN[Kim, Kyong Nam]; Jeon, MH[Jeon, Min Hwan]; Lim, JT[Lim, Jong Tae]; Yeom, GY[Yeom, Geun Young]

ArticleIssue Date2011CitationPLASMA CHEMISTRY AND PLASMA PROCESSING, v.31, no.3, pp.507 - 515

SCIESCOPUS

Plasma Characteristics of Large Area Inductively Coupled Plasma System Using Ferrite-Module-Enhanced U-Type Antenna

Kim, KN[Kim, Kyong Nam]; Lim, JH[Lim, Jong Hyeuk]; Yeom, GY[Yeom, Geun Young]

ArticleIssue Date2009CitationJAPANESE JOURNAL OF APPLIED PHYSICS, v.48, no.11PublisherJAPAN SOCIETY APPLIED PHYSICS

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