Plasma and electrical characteristics of a novel internal linear inductively coupled plasma source for flat panel display applications
- Authors
- Kim, KN[Kim, KN]; Yeom, GY[Yeom, GY]
- Issue Date
- Mar-2006
- Publisher
- KOREAN PHYSICAL SOC
- Keywords
- plasma; large area; display; etching
- Citation
- JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.48, no.3, pp.422 - 426
- Indexed
- SCIE
SCOPUS
KCI
- Journal Title
- JOURNAL OF THE KOREAN PHYSICAL SOCIETY
- Volume
- 48
- Number
- 3
- Start Page
- 422
- End Page
- 426
- URI
- https://scholarworks.bwise.kr/skku/handle/2021.sw.skku/87555
- ISSN
- 0374-4884
- Abstract
- In this study, using two different linear internal-type inductively coupled plasma, sources with a serpentine-type antenna, and a novel double-comb-type antenna having the size of 1,020 mm x 830 mm, are compared the characteristics of plasmas for the application to the flat panel display manufacturing. The use of the double-comb-type antenna instead of the serpentine-type antenna showed a higher plasma density, a higher radical density, and more plasma stability when an inductive power higher than 2000 W was applied to the source. By the application of a 5000 W inductive power with 15 mTorr Ar, a, high plasma density of 2.2 x 10(11)/cm(3) with a plasma uniformity of 8 % could be obtained for the double-comb-type antenna. The increases in the plasma density, the radical density, and the plasma stability for the double comb-type antenna compared to the serpentine-type antenna are due to its higher inductive coupling and lower standing wave effect.
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Collections - Engineering > School of Advanced Materials Science and Engineering > 1. Journal Articles
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