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Significantly Enhanced Conformal Contact by the Functional Layers on a Copper Film for Thermal Interface Materials

Authors
Alayli, MohamadKim, TaehunCheon, SeongsuBaik, Seunghyun
Issue Date
Apr-2024
Publisher
John Wiley and Sons Inc
Keywords
copper films; soft functional layers; thermal conductivities; thermal interface materials; thermal resistances
Citation
Advanced Engineering Materials, v.26, no.7
Indexed
SCIE
SCOPUS
Journal Title
Advanced Engineering Materials
Volume
26
Number
7
URI
https://scholarworks.bwise.kr/skku/handle/2021.sw.skku/110477
DOI
10.1002/adem.202301823
ISSN
1438-1656
1527-2648
Abstract
Low-cost thermal interface materials with high thermal conductivity (κ) and low total thermal resistance (Rt) receive considerable attention for thermal management. A copper film (CuFilm) is an excellent candidate due to the high κ (364 Wm−1 K−1) it possesses. However, the practical implementation is hindered by its high elastic modulus (Es = 70.8 GPa), inducing a high contact thermal resistance (Rc = 91.6 mm2 K W−1). Herein, the selective construction of electrically conducting or insulating layers on CuFilm to dramatically decrease Es, Rc, and Rt is reported. The highly electrically and thermally conducting layer is synthesized by incorporating in situ reduced copper nanoparticles (CuNPs, 35 vol%) and multiwalled carbon nanotubes embellished with CuNPs (1.5 vol%) in polyethylene glycol. The high effective κ (92.7 Wm−1 K−1) still maintains a low specimen thermal resistance (Rs = 4.9 mm2 K W−1), while the dramatically softened surface (Es = 5.7 GPa) decreases Rc (8.3 mm2 K W−1), resulting in a very small Rt (13.2 mm2 K W−1). Alternatively, the electrically insulating but thermally conducting layer is constructed using aluminum nitride particles. The κ is still high (72.1 Wm−1 K−1) with a small Rt (47.5 mm2 K W−1). The facile fabrication based on a CuFilm enables cost-effective thermal interface materials with tunable electrical and thermal properties. © 2023 Wiley-VCH GmbH.
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