Structure and electrical properties of boron doped hydrogenated mixed-phase silicon films for uncooled microbolometer
- Authors
- Shin, C[Shin, Chonghoon]; Pham, DP[Duy Phong Pham]; Park, J[Park, Jinjoo]; Kim, S[Kim, Sangho]; Lee, YJ[Lee, Youn-Jung]; Yi, J[Yi, Junsin]
- Issue Date
- Jan-2019
- Publisher
- ELSEVIER SCIENCE BV
- Keywords
- Micro-bolometers; Infrared detectors; Boron doped hydrogenated silicon films; Mixed-phase silicon films
- Citation
- INFRARED PHYSICS & TECHNOLOGY, v.96, pp.84 - 88
- Indexed
- SCIE
SCOPUS
- Journal Title
- INFRARED PHYSICS & TECHNOLOGY
- Volume
- 96
- Start Page
- 84
- End Page
- 88
- URI
- https://scholarworks.bwise.kr/skku/handle/2021.sw.skku/11473
- DOI
- 10.1016/j.infrared.2018.10.015
- ISSN
- 1350-4495
- Abstract
- Boron doped hydrogenated silicon films used as thereto-sensing layers in infrared detectors or uncooled microbolometers are prepared by radio-frequency plasma-enhanced chemical vapor deposition (PECVD). In this work, we investigated TCR (higher the better) and sheet resistance, R-sheet (lower the better), which are important factors for thermos-sensing layer used in uncooled microbolometer. The crystalline volume fraction (X-c) of films is controlled to get silicon films that satisfy the characteristics of high TCR and low Rsheet. Through the control, amorphous, mixed- and microcrystalline phases were identified. As a result, the best TCR and Rsheet were obtained in the mixed-phase. For the films, TRC is around 1-3%/K, R-sheet is around 3-61.4 M Omega/square and X-c is around 7-17%. The 1/f noise is measured for various phases. It is found that 1/f noise of boron doped hydrogenated mixed-phase silicon (BMP-Si:H) is smaller than that of the amorphous phase. The results of BMP-Si:H films show that they are more suitable as thermos-sensing layers than boron doped hydrogenated amorphous silicon films.
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Collections - Information and Communication Engineering > School of Electronic and Electrical Engineering > 1. Journal Articles
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