High-Crystalline Monolayer Transition Metal Dichalcogenides Films for Wafer-Scale Electronics
- Authors
- Kim, M[Kim, Minseong]; Seo, J[Seo, Jihyung]; Kim, J[Kim, Jihyun]; Moon, JS[Moon, Jong Sung]; Lee, J[Lee, Junghyun]; Kim, JH[Kim, Je-Hyung]; Kang, J[Kang, Joohoon]; Park, H[Park, Hyesung]
- Issue Date
- Feb-2021
- Publisher
- AMER CHEMICAL SOC
- Keywords
- alkali metal halide; high crystallinity; large-area; liquid-phase precursor; transition metal dichalcogenides
- Citation
- ACS NANO, v.15, no.2, pp.3038 - 3046
- Indexed
- SCIE
SCOPUS
- Journal Title
- ACS NANO
- Volume
- 15
- Number
- 2
- Start Page
- 3038
- End Page
- 3046
- URI
- https://scholarworks.bwise.kr/skku/handle/2021.sw.skku/17507
- DOI
- 10.1021/acsnano.0c09430
- ISSN
- 1936-0851
- Abstract
- Chemical vapor deposition (CVD) using liquid-phase precursors has emerged as a viable technique for synthesizing uniform large-area transition metal dichalcogenide (TMD) thin films. However, the liquid-phase precursor-assisted growth process typically suffers from small-sized grains and unreacted transition metal precursor remainders, resulting in lower-quality TMDs. Moreover, synthesizing large-area TMD films with a monolayer thickness is also quite challenging. Herein, we successfully synthesized high-quality large-area monolayer molybdenum diselenide (MoSe2) with good uniformity via promoter-assisted liquid-phase CVD process using the transition metal-containing precursor homogeneously modified with an alkali metal halide. The formation of a reactive transition metal oxyhalide and reduction of the energy barrier of chalcogenization by the alkali metal promoted the growth rate of the TMDs along the in-plane direction, enabling the full coverage of the monolayer MoSe2 film with negligible few-layer regions. Note that the fully selenized monolayer MoSe2 with high crystallinity exhibited superior electrical transport characteristics compared with those reported in previous works using liquid-phase precursors. We further synthesized various other monolayer TMD films, including molybdenum disulfide, tungsten disulfide, and tungsten diselenide, to demonstrate the broad applicability of the proposed approach.
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- Appears in
Collections - Engineering > School of Advanced Materials Science and Engineering > 1. Journal Articles
- Graduate School > Advanced Materials Science and Engineering > 1. Journal Articles
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