Plasma etched PMMA/CaF2 anti-reflection coating for light weight PV module
- Authors
- ZAHID, M. A.[ZAHID, MUHAMMAD ALEEM]; Park, H.[Park, H.]; Cho, Y.H.[Cho, Y.H.]; Yi, J.[Yi, J.]
- Issue Date
- Feb-2021
- Publisher
- Elsevier B.V.
- Keywords
- Anti-Reflection coating; Calcium fluoride; Electrical properties; Optical properties; Plasma surface etching; PMMA
- Citation
- Optical Materials, v.112
- Indexed
- SCIE
SCOPUS
- Journal Title
- Optical Materials
- Volume
- 112
- URI
- https://scholarworks.bwise.kr/skku/handle/2021.sw.skku/25120
- DOI
- 10.1016/j.optmat.2021.110813
- ISSN
- 0925-3467
- Abstract
- Polymethylmethacrylate (PMMA) is an ideal replacement of glass where impact of weight is a serious issue. PMMA surface can be modified to make it highly transparent substrate. PMMA substrate was etched using a plasma etching system with oxygen plasma. CaF2 was deposited on to the etched PMMA via vacuum thermal evaporation to create anti-reflection coating. The effects of the treated PMMA were analysed using different characterisation techniques. An average increase in transmittance of approximately 4% was observed on 50 W RF power treated PMMA, compared to untreated PMMA in the broadband spectrum of 400–1100 nm. An enhancement in short circuit current from 36.71 to 37.62 mA/cm2 and an increase in efficiency of 2.35% was achieved when the treated PMMA was placed on a solar cell as a front cover sheet to model a lightweight photovoltaic module. These findings indicate the possibility of improving the surface morphology, optical and electrical characteristics of PMMA via treatment for photovoltaic applications. © 2021 Elsevier B.V.
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Collections - Information and Communication Engineering > School of Electronic and Electrical Engineering > 1. Journal Articles
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