Designs and processes toward high-aspect-ratio nanostructures at the deep nanoscale: unconventional nanolithography and its applications
- Authors
- Lee, S[Lee, Sori]; Park, B[Park, Byeonghak]; Kim, JS[Kim, Jun Sik]; Kim, TI[Kim, Tae-il]
- Issue Date
- 25-Nov-2016
- Publisher
- IOP PUBLISHING LTD
- Keywords
- high aspect ratio; nanofabrication; high resolution; unconventional lithography
- Citation
- NANOTECHNOLOGY, v.27, no.47
- Indexed
- SCIE
SCOPUS
- Journal Title
- NANOTECHNOLOGY
- Volume
- 27
- Number
- 47
- URI
- https://scholarworks.bwise.kr/skku/handle/2021.sw.skku/34336
- DOI
- 10.1088/0957-4484/27/47/474001
- ISSN
- 0957-4484
- Abstract
- The patterning of high-resolution-featured deep-nanoscale structures with a high aspect ratio (AR) has received increasing attention in recent years as a promising technique for a wide range of applications, including electrical, optical, mechanical and biological systems. Despite extensive efforts to develop viable nanostructure fabrication processes, a superior technique enabling defect-free, high-resolution control over a large area is still required. In this review, we focus on recent important advances in the designs and processes of high-resolution nanostructures possessing a high AR, including hierarchical and 3D patterns. The unique applications of these materials are also discussed.
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- Appears in
Collections - Engineering > Chemical Engineering > 1. Journal Articles
- Engineering > School of Chemical Engineering > 1. Journal Articles
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