Low-temperature growth of layered molybdenum disulphide with controlled clustersopen access
- Authors
- Mun, J[Mun, Jihun]; Kim, Y[Kim, Yeongseok]; Kang, IS[Kang, Il-Suk]; Lim, SK[Lim, Sung Kyu]; Lee, SJ[Lee, Sang Jun]; Kim, JW[Kim, Jeong Won]; Park, HM[Park, Hyun Min]; Kim, T[Kim, Taesung]; Kang, SW[Kang, Sang-Woo]
- Issue Date
- 23-Feb-2016
- Publisher
- NATURE PUBLISHING GROUP
- Citation
- SCIENTIFIC REPORTS, v.6
- Indexed
- SCIE
SCOPUS
- Journal Title
- SCIENTIFIC REPORTS
- Volume
- 6
- URI
- https://scholarworks.bwise.kr/skku/handle/2021.sw.skku/37748
- DOI
- 10.1038/srep21854
- ISSN
- 2045-2322
- Abstract
- Layered molybdenum disulphide was grown at a low-temperature of 350 degrees C using chemical vapour deposition by elaborately controlling the cluster size. The molybdenum disulphide grown under various sulphur-reaction-gas to molybdenum-precursor partial-pressure ratios were examined. Using spectroscopy and microscopy, the effect of the cluster size on the layered growth was investigated in terms of the morphology, grain size, and impurity incorporation. Triangular single-crystal domains were grown at an optimized sulphur-reaction-gas to molybdenum-precursor partial-pressure ratio. Furthermore, it is proved that the nucleation sites on the silicon-dioxide substrate were related with the grain size. A polycrystalline monolayer with the 100-nm grain size was grown on a nucleation site confined substrate by high-vacuum annealing. In addition, a field-effect transistor was fabricated with a MoS2 monolayer and exhibited a mobility and on/off ratio of 0.15 cm(2)V(-1)s(-1) and 10(5), respectively.
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - Engineering > School of Mechanical Engineering > 1. Journal Articles
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.