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Surface passivation schemes for high-efficiency c-Si solar cells - A reviewSurface Passivation Schemes for High-Efficiency c-Si Solar Cells - A Review

Other Titles
Surface Passivation Schemes for High-Efficiency c-Si Solar Cells - A Review
Authors
Balaji, N.[Balaji, N.]Hussain, S.Q.[Hussain, S.Q.]Park, C.[Park, C.]Raja, J.[Raja, J.]Yi, J.[Yi, J.]Jeyakumar, R.[Jeyakumar, R.]
Issue Date
2015
Publisher
한국전기전자재료학회
Keywords
Al2O3; Passivation; SiNx; SiO2
Citation
Transactions on Electrical and Electronic Materials, v.16, no.5, pp.227 - 233
Indexed
SCOPUS
KCI
Journal Title
Transactions on Electrical and Electronic Materials
Volume
16
Number
5
Start Page
227
End Page
233
URI
https://scholarworks.bwise.kr/skku/handle/2021.sw.skku/49663
DOI
10.4313/TEEM.2015.16.5.227
ISSN
1229-7607
Abstract
To reduce the cost of solar electricity, the crystalline-silicon (c-Si) photovoltaic industry is moving toward the use of thinner wafers (100 μm to 200 μm) to achieve a high efficiency. In this field, it is imperative to achieve an effective passivation method to reduce the electronic losses at the c-Si interface. In this article, we review the most promising surface passivation schemes that are available for high-efficiency solar cells. © 2015 KIEEME. All rights reserved.
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Information and Communication Engineering > School of Electronic and Electrical Engineering > 1. Journal Articles
Graduate School > Energy Science > 1. Journal Articles

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