Detailed Information
Cited 3 time in 
Cited 2 time in 
Cited 2 time in
Metadata Downloads
Oxidative modification of imprinted nanopatterns assisted by heat and plasma
- Authors
- Jeong, M[Jeong, Mira]; Lee, J[Lee, JaeJong]; Park, DK[Park, Dae Keun]; Kang, A[Kang, Aeyeon]; Yun, WS[Yun, Wan Soo]
- Issue Date
- 30-Sep-2014
- Publisher
- ELSEVIER SCIENCE SA
- Keywords
- Nanoimprint; Nanopattern; Nanostructure; Oxidative etching; Chemical modification
- Citation
- THIN SOLID FILMS, v.567, pp.54 - 57
- Indexed
- SCIE
SCOPUS
- Journal Title
- THIN SOLID FILMS
- Volume
- 567
- Start Page
- 54
- End Page
- 57
- ISSN
- 0040-6090
- Abstract
- We report on a simple and efficient linewidth modification of imprinted nanopatterns by heat and plasma assisted oxidation. Addition of oxygen was found to be critical in reducing the process temperature and the efficiency of the linewidth reduction. The linewidth defined by nanoimprint lithography (NIL) can be reduced more than 60% without any deterioration of structural details of the fine patterns. Weakened material dependence of this oxidative process was verified from the results obtained from the experiments adopting various materials. Furthermore, it was also demonstrated that this method could be applied in the modification of different types of nanopatterns prepared by the NIL. (C) 2014 Elsevier B.V. All rights reserved.
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - Science > Department of Chemistry > 1. Journal Articles
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.