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Determination of the Drain Saturation Voltage of a Metal-Oxide-Semiconductor Field-Effect Transistor by the Capacitance-Voltage Method

Authors
Kim, K[Kim, Kwangsoo]Choi, P[Choi, Pyungho]Kim, H[Kim, Hyungjoon]Park, H[Park, Hyoungsun]Choi, B[Choi, Byoungdeog]
Issue Date
Jun-2013
Publisher
JAPAN SOC APPLIED PHYSICS
Citation
JAPANESE JOURNAL OF APPLIED PHYSICS, v.52, no.6
Indexed
SCIE
SCOPUS
Journal Title
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume
52
Number
6
URI
https://scholarworks.bwise.kr/skku/handle/2021.sw.skku/60401
DOI
10.7567/JJAP.52.068005
ISSN
0021-4922
Abstract
In this paper, we present a simple technique to extract drain saturation voltage using the drain junction capacitance-voltage data of a metal-oxide-semiconductor field-effect transistor (MOSFET). When voltage is applied to the gate terminal, the drain and source are connected electrically via a surface inversion charge, and drain junction capacitance increases. When drain voltage increases, the pinch-off occurs at the drain end of the channel, and drain junction capacitance is rapidly reduced. Through this phenomenon, we can extract the drain saturation voltage directly from the drain junction capacitance-voltage curve without using complex mathematical formulas. (C) 2013 The Japan Society of Applied Physics
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