Effect of p-type a-SiO:H buffer layer at the interface of TCO and p-type layer in hydrogenated amorphous silicon solar cells
- Authors
- Kim, Y[Kim, Youngkuk]; Iftiquar, SM[Iftiquar, S. M.]; Park, J[Park, Jinjoo]; Lee, J[Lee, Jeongchul]; Yi, J[Yi, Junsin]
- Issue Date
- Nov-2012
- Publisher
- KOREAN ASSOC CRYSTAL GROWTH, INC
- Keywords
- Hydrogenated amorphous silicon solar cell; RF PECV
- Citation
- JOURNAL OF CERAMIC PROCESSING RESEARCH, v.13, pp.S336 - S340
- Indexed
- SCIE
SCOPUS
KCI
- Journal Title
- JOURNAL OF CERAMIC PROCESSING RESEARCH
- Volume
- 13
- Start Page
- S336
- End Page
- S340
- URI
- https://scholarworks.bwise.kr/skku/handle/2021.sw.skku/63820
- ISSN
- 1229-9162
- Abstract
- Wide band gap p-type hydrogenated amorphous silicon oxide (a-SiO:H) buffer layer has been used at the interface of transparent conductive oxide (TCO) and hydrogenated amorphous silicon (a-Si:H) p-type layer of a p-i-n type a-Si:H solar cell. Introduction of 5 nm thick buffer layer improves in blue response of the cell along with 0.5% enhancement of photovoltaic conversion efficiency (eta). The cells with buffer layer show higher open circuit voltage (V-oc), fill factor (FF), short circuit current density (J(sc)) and improved blue response with respect to the cell without buffer layer.
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- Appears in
Collections - Information and Communication Engineering > School of Electronic and Electrical Engineering > 1. Journal Articles
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