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Linear inductive antenna design for large area flat panel display plasma processing
- Authors
- Kim, KN[Kim, K. N.]; Lim, JH[Lim, J. H.]; Jeong, HB[Jeong, H. B.]; Yeom, GY[Yeom, G. Y.]; Lee, SH[Lee, S. H.]; Lee, JK[Lee, J. K.]
- Issue Date
- Jan-2012
- Publisher
- ELSEVIER SCIENCE BV
- Citation
- MICROELECTRONIC ENGINEERING, v.89, pp.133 - 137
- Indexed
- SCIE
SCOPUS
- Journal Title
- MICROELECTRONIC ENGINEERING
- Volume
- 89
- Start Page
- 133
- End Page
- 137
- ISSN
- 0167-9317
- Abstract
- Two different internal-type linear inductive antenna arrangements, that is, parallel and anti-parallel antenna arrangements having different current directions between adjacent antennas were investigated for a large area plasma source having the size of 1020 mm x 830 mm. The electric field profile and plasma density of Ar calculated by the F2L code showed consistent results with the experimental results on the plasma density and processing results. The results showed that the anti-parallel antenna arrangement showed better plasma uniformity compared to the parallel antenna arrangement due to the destructive Er-field between adjacent antennas even though the destructive Er-field decreases the plasma density at the center of the chamber. (C) 2011 Elsevier B.V. All rights reserved.
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