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Fabrication of KTa0.65Nb0.35O3 film by pulsed laser deposition on glass substrate with various buffer layers
- Issue Date
- Nov-2011
- Keywords
- Buffer layer; KTa0.65Nb0.35O3; Pulsed laser deposition
- Citation
- OPTICAL MATERIALS, v.34, no.1, pp.269 - 273
- Indexed
- SCIE
SCOPUS
- Journal Title
- OPTICAL MATERIALS
- Volume
- 34
- Number
- 1
- Start Page
- 269
- End Page
- 273
- ISSN
- 0925-3467
- Abstract
- KTa(0.65)Nba(0.35)O(3) (KTN) thin films were deposited on amorphous glass substrates using a range of single buffer layers such as indium tin oxide (ITO), zinc oxide (ZnO), 3 at% Al-doped ZnO (AZO), and 3 at% Ga-doped ZnO (GZO), as well as a variety of multi-buffer layers such as SrTiO3(STO)/ITO,STO/ZnO, STO/AZO, and STO/GZO using a pulsed laser deposition system. All films showed a polycrystalline perovskite phase with the exception of all single buffer layers and STO/ITO multi-buffer layers. The STO buffer layer is important for crystallizing KTN films due to the similar lattice constant and same crystal structure. The optical transmittance of all films exhibited a transmittance >= 90% in the wavelength range. (C) 2011 Elsevier B.V. All rights reserved.
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Collections - Graduate School > SKKU Advanced Institute of Nano Technology > 1. Journal Articles
- Information and Communication Engineering > School of Electronic and Electrical Engineering > 1. Journal Articles
- Engineering > School of Advanced Materials Science and Engineering > 1. Journal Articles
- Information and Communication Engineering > School of Electronic and Electrical Engineering > 1. Journal Articles
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Related Researcher
- YOON, DAE HO
- Engineering (Advanced Materials Science and Engineering)