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A high-performing nanostructured TiO2 filter for volatile organic compounds using atomic layer deposition
- Authors
- Lee, HJ[Lee, Hye Jin]; Seo, HO[Seo, Hyun Ook]; Kim, DW[Kim, Dong Wun]; Kim, KD[Kim, Kwang-Dae]; Luo, Y[Luo, Yuan]; Lim, DC[Lim, Dong Chan]; Ju, H[Ju, HyungKuk]; Kim, JW[Kim, Jin Won]; Lee, J[Lee, Jaeyoung]; Kim, YD[Kim, Young Dok]
- Issue Date
- 2011
- Citation
- CHEMICAL COMMUNICATIONS, v.47, no.19, pp.5605 - 5607
- Indexed
- SCIE
SCOPUS
- Journal Title
- CHEMICAL COMMUNICATIONS
- Volume
- 47
- Number
- 19
- Start Page
- 5605
- End Page
- 5607
- ISSN
- 1359-7345
- Abstract
- Novel nanostructured gas filtering systems with TiO2 thin films using atomic layer deposition (ALD) were developed for volatile organic compounds. A superior toluene adsorption efficiency was found for the nanostructured TiO2 thin films.
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