Detailed Information
Cited 24 time in 
Cited 27 time in 
Cited 27 time in
Metadata Downloads
Fabrication of low-cost mold and nanoimprint lithography using polystyrene nanosphere
- Authors
- Jeong, GH[Jeong, G. H.]; Park, JK[Park, J. K.]; Lee, KK[Lee, K. K.]; Jang, JH[Jang, J. H.]; Lee, CH[Lee, C. H.]; Kang, HB[Kang, H. B.]; Yang, CW[Yang, C. W.]; Suh, SJ[Suh, S. J.]
- Issue Date
- Jan-2010
- Publisher
- ELSEVIER SCIENCE BV
- Keywords
- Nanoimprint lithography; Nanosphere; Polymer mold; Nanopatterning
- Citation
- MICROELECTRONIC ENGINEERING, v.87, no.1, pp.51 - 55
- Indexed
- SCIE
SCOPUS
- Journal Title
- MICROELECTRONIC ENGINEERING
- Volume
- 87
- Number
- 1
- Start Page
- 51
- End Page
- 55
- ISSN
- 0167-9317
- Abstract
- The periodic arrays of nanostructure were successfully patterned on Si wafers by ultraviolet nanoimprint lithography (UV-NIL) using nanosphere lithography (NSL). Two-dimensional (2D) well ordered self-assembled arrays were obtained on Si wafer by using nanosphere and the tilted-drain method. We tried to combine two techniques and hard mold of Si mold for NIL and polymer mold of acrylate-based polymer were fabricated by NSL. The Si master mold and polymer mold were formed by Cr lift-off and ICP-RIE process. The surface has a low surface energy at the interface with 1 H. 1H, 2H, 2H-perfluorooctyl-trichlorosilane (FOTS) vapor-coating, which can eliminate the problem of the adherence to the surface of the mold during demolding. Finally, nanopatterns were formed by UV-NIL, where the residual layer was not observed. (C) 2009 Elsevier B.V. All rights reserved.
- Files in This Item
- There are no files associated with this item.
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
Related Researcher
- YANG, CHEOL WOONG
- Engineering (Advanced Materials Science and Engineering)