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Characteristics of Internal Inductively Coupled Plasma Source for Ultralarge-Area Plasma Processing
- Authors
- Lim, JH[Lim, Jong Hyeuk]; Gweon, GH[Gweon, Gwang Ho]; Hong, SP[Hong, Seung Pyo]; Kim, KN[Kim, Kyong Nam]; Kim, YY[Kim, Yi Yeon]; Yeom, GY[Yeom, Geun Young]
- Issue Date
- 2010
- Publisher
- IOP PUBLISHING LTD
- Citation
- JAPANESE JOURNAL OF APPLIED PHYSICS, v.49, no.3
- Indexed
- SCIE
SCOPUS
- Journal Title
- JAPANESE JOURNAL OF APPLIED PHYSICS
- Volume
- 49
- Number
- 3
- ISSN
- 0021-4922
- Abstract
- The capacitive-inductive (E-H) mode transition characteristics of an ultralarge-area (2, 750 x 2, 350mm(2)) inductively coupled plasma (ICP) system with multiple internal U-type antennas have been investigated. When the electrical characteristics of the ICP antenna such as power transfer efficiency and ICP source impedance, were measured as a function of ICP power, a distinctive change from E to H mode was identified at an rf power of approximately 3 kW. When the power transfer mode was changed from capacitive to inductive for the multiple U-type antenna configuration, better plasma uniformity was obtained owing to the more uniform power deposition along the antenna line. (C) 2010 The Japan Society of Applied Physics
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