Gold Stripe Optical Waveguides Fabricated by a Novel Double-Layered Liftoff Process
- Authors
- Kim, JT[Kim, Jin Tae]; Park, S[Park, Suntak]; Park, SK[Park, Seung Koo]; Kim, MS[Kim, Min-su]; Lee, MH[Lee, Myung-Hyun]; Ju, JJ[Ju, Jung Jin]
- Issue Date
- Dec-2009
- Publisher
- ELECTRONICS TELECOMMUNICATIONS RESEARCH INST
- Citation
- ETRI JOURNAL, v.31, no.6, pp.778 - 783
- Indexed
- SCIE
SCOPUS
KCI
- Journal Title
- ETRI JOURNAL
- Volume
- 31
- Number
- 6
- Start Page
- 778
- End Page
- 783
- URI
- https://scholarworks.bwise.kr/skku/handle/2021.sw.skku/76482
- DOI
- 10.4218/etrij.09.1209.0042
- ISSN
- 1225-6463
- Abstract
- To fabricate uniform and reliable thin gold stripes that provide low-loss optical waveguides, we developed a novel liftoff process placing an additional SiN(x) layer under conventional photoresists. By patterning a photoresist and over-etching the SiN(x), the photoresist patterns become free-standing structures on a lower-cladding. This leads to uniform metal stripes with good reproducibility and effectively removes parasitic structures on the edge of the metal stripe in the image reversal photolithography process. By applying the newly developed process to polymer-based gold stripe waveguide fabrication, we improved the propagation losses about two times compared with that incurred by the conventional image-reversal process.
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- Appears in
Collections - Information and Communication Engineering > School of Electronic and Electrical Engineering > 1. Journal Articles
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