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SLM-based maskless lithography for TFT-LCD
- Authors
- Kim, KR[Kim, Kwang-Ryul]; Yi, J[Yi, Junsin]; Cho, SH[Cho, Sung-Hak]; Kang, NH[Kang, Nam-Hyun]; Cho, MW[Cho, Myung-Woo]; Shin, BS[Shin, Bo-Sung]; Choi, B[Choi, Byoungdeog]
- Issue Date
- 30-Jun-2009
- Publisher
- ELSEVIER SCIENCE BV
- Keywords
- Spatial light modulator; Maskless lithography; DMD; GLV
- Citation
- APPLIED SURFACE SCIENCE, v.255, no.18, pp.7835 - 7840
- Indexed
- SCIE
SCOPUS
- Journal Title
- APPLIED SURFACE SCIENCE
- Volume
- 255
- Number
- 18
- Start Page
- 7835
- End Page
- 7840
- ISSN
- 0169-4332
- Abstract
- Maskless photolithographic methods have been developed using digital micromirror devices (DMDs) and grating light valves (GLVs), which are spatial light modulators (SLMs), because liquid crystal display (LCD) panel industries spend huge amounts of money for the cost of TFT (thin film resist)-LCD photomasks. The technology has been developed for implementing 2 mu m bitmap resolutions, which is a requirement for the lithographic process, though the process time is still slow for mass-production system. A DMD-based maskless exposure uses 405 nm-wavelength semiconductor lasers as an illumination source and optical engines that contain DMDs, micro lens arrays (MLAs), and projection lenses. A GLV-based system consists of UV lasers and optical write engines, which are constructed with the GLV, grating optics, and imaging lenses. Since many companies have been trying to overcome the time limitations, the maskless technology will be realized in the LCD industry in near future. (C) 2009 Elsevier B. V. All rights reserved.
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Related Researcher
- CHOI, BYOUNG DEOG
- Information and Communication Engineering (Electronic and Electrical Engineering)