Fabrication and characterization of metal-oxide-nitride-oxynitride-polysilicon nonvolatile semiconductor memory device with silicon oxynitride (SiOxNy) as tunneling layer on glass
- Authors
- Jung, S[Jung, Sungwook]; Kim, J[Kim, Jaehong]; Son, H[Son, Hyukjoo]; Hwang, S[Hwang, Sunghyun]; Jang, K[Jang, Kyungsoo]; Lee, J[Lee, Jungin]; Lee, K[Lee, Kwangsoo]; Park, H[Park, Hyungjun]; Kim, K[Kim, Kyunghae]; Yi, J[Yi, Junsin]; Chung, H[Chung, Hokyoon]; Choi, B[Choi, Byoungdeog]; Lee, K[Lee, Kiyong]
- Issue Date
- 1-Nov-2007
- Publisher
- AMER INST PHYSICS
- Citation
- JOURNAL OF APPLIED PHYSICS, v.102, no.9
- Indexed
- SCIE
SCOPUS
- Journal Title
- JOURNAL OF APPLIED PHYSICS
- Volume
- 102
- Number
- 9
- URI
- https://scholarworks.bwise.kr/skku/handle/2021.sw.skku/83594
- DOI
- 10.1063/1.2802201
- ISSN
- 0021-8979
- Abstract
- A nonvolatile semiconductor memory (NVSM) device with a metal-oxide-nitride-oxynitride-polysilicon (MONOS) structure on a rough polysilicon (poly-Si) surface was fabricated using a low-temperature process and poly-Si thin film transistor (TFT) technology on glass. For the fabrication of the NVSM device on glass, plasma-assisted oxynitridation was carried out using nitrous oxide (N2O) as a reactive gas, due to the very rough surface of the poly-Si on glass annealed using an excimer laser. The ultrathin SiOxNy films obtained using the N2O plasma have a very uniform distribution on poly-Si and similar contents of oxygen and nitrogen in the peaks and valleys of the grains. The NVSM devices having a MONOS structure with a tunneling layer of ultrathin SiOxNy on glass have suitable switching and charge retention characteristics for data storage. The results demonstrate that the NVSM device made using low-temperature poly-Si TFT technology on glass reported in this paper can be used in various types of display devices. (C) 2007 American Institute of Physics.
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