Lee, WJ[Lee, W. J.]; Ma, JW[Ma, J. W.]; Bae, JM[Bae, J. M.]; Kim, CY[Kim, C. Y.]; Jeong, KS[Jeong, K. S.]; Cho, MH[Cho, M. -H.]; Chung, KB[Chung, K. B.]; Kim, H[Kim, H.]; Cho, HJ[Cho, H. J.]; Kim, DC[Kim, D. C.]
ArticleIssue Date2013CitationCURRENT APPLIED PHYSICS, v.13, no.4, pp.633 - 639PublisherELSEVIER SCIENCE BV