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CMOS class-E power amplifier (1.8-GHz) with an additional thin-film technology

Authors
Park, C.Seo, C.
Issue Date
Nov-2010
Publisher
INST ENGINEERING TECHNOLOGY-IET
Citation
IET CIRCUITS DEVICES & SYSTEMS, v.4, no.6, pp.479 - 485
Journal Title
IET CIRCUITS DEVICES & SYSTEMS
Volume
4
Number
6
Start Page
479
End Page
485
URI
http://scholarworks.bwise.kr/ssu/handle/2018.sw.ssu/14646
DOI
10.1049/iet-cds.2010.0014
ISSN
1751-858X
Abstract
A 1.8-GHz power amplifier is implemented using the 0.18-mu m Radio Frequency (RF) Complementary Metal Oxide Semiconductor (CMOS) process. An additional thin-film technology on a separate substrate is used to design the output matching network for high efficiency. To minimise the number of bond-wires, a single differential power stage is used. The output matching network was completed with the proposed load impedance transformer and an Metal Insulator Metal (MIM) capacitor using additional thin-film technology. The amplifier achieved a drain efficiency of 50.5% at a maximum output power of 31.6 dBm at 1.81 GHz.
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