Thermodynamic aspects of bis(3-sulfopropyl) disulfide and 3-mercapto-1-propanesulfonic acid in Cu electrodeposition
DC Field | Value | Language |
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dc.contributor.author | Shen, Huizi | - |
dc.contributor.author | Kim, Hoe Chul | - |
dc.contributor.author | Sung, Minjae | - |
dc.contributor.author | Lim, Taeho | - |
dc.contributor.author | Kim, Jae Jeong | - |
dc.date.available | 2019-03-13T01:45:05Z | - |
dc.date.created | 2018-09-12 | - |
dc.date.issued | 2018-05 | - |
dc.identifier.issn | 1572-6657 | - |
dc.identifier.uri | http://scholarworks.bwise.kr/ssu/handle/2018.sw.ssu/31713 | - |
dc.description.abstract | Organic additives play an important role in regulating film growth and properties in Cu electrodepositlon. 3-Mercapto-1-propane sulfonate (MPS) and its dimer bis(3-sulfopropyl) disulfide (SPS) are representative accelerators that promote Cu electrodeposition rate. In this study, the formal reduction potential of SPS to MPS was determined by measuring the equilibrium constants of thiol-disulfide interchange reactions with the reference thiol/disulfide pairs by H-1 nuclear magnetic resonance (H-1 NMR) spectroscopy. The calculated formal reduction potential of SPS to MPS was 0.153 V (vs. standard hydrogen electrode). Based on this calculation, the cell potentials of Cu(I)(thiolate) formation reaction with either SPS or MPS, which is a key reaction in accelerating mechanism, were also estimated by ultraviolet-visible absorption and H-1 NMR spectroscopies: they were found to be 0.202 V and 0.214 V for SPS and MPS, respectively. The positive cell potential indicates that the formation of Cu(I)(thiolate) complexes is thermodynamically favorable in the presence of additives. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER SCIENCE SA | - |
dc.relation.isPartOf | JOURNAL OF ELECTROANALYTICAL CHEMISTRY | - |
dc.subject | COPPER ELECTRODEPOSITION | - |
dc.subject | CATALYTIC BEHAVIOR | - |
dc.subject | SPS | - |
dc.subject | PEG | - |
dc.subject | GLUTATHIONE | - |
dc.subject | ADSORPTION | - |
dc.subject | ADDITIVES | - |
dc.subject | CHEMISTRY | - |
dc.subject | ION | - |
dc.subject | CL | - |
dc.title | Thermodynamic aspects of bis(3-sulfopropyl) disulfide and 3-mercapto-1-propanesulfonic acid in Cu electrodeposition | - |
dc.type | Article | - |
dc.identifier.doi | 10.1016/j.jelechem.2018.03.048 | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | JOURNAL OF ELECTROANALYTICAL CHEMISTRY, v.816, pp.132 - 137 | - |
dc.description.journalClass | 1 | - |
dc.identifier.wosid | 000431156900018 | - |
dc.identifier.scopusid | 2-s2.0-85044618190 | - |
dc.citation.endPage | 137 | - |
dc.citation.startPage | 132 | - |
dc.citation.title | JOURNAL OF ELECTROANALYTICAL CHEMISTRY | - |
dc.citation.volume | 816 | - |
dc.contributor.affiliatedAuthor | Lim, Taeho | - |
dc.type.docType | Article | - |
dc.description.isOpenAccess | N | - |
dc.subject.keywordAuthor | Cu electrodepositlon | - |
dc.subject.keywordAuthor | Accelerator | - |
dc.subject.keywordAuthor | SPS | - |
dc.subject.keywordAuthor | MPS | - |
dc.subject.keywordAuthor | Reduction potential | - |
dc.subject.keywordPlus | COPPER ELECTRODEPOSITION | - |
dc.subject.keywordPlus | CATALYTIC BEHAVIOR | - |
dc.subject.keywordPlus | SPS | - |
dc.subject.keywordPlus | PEG | - |
dc.subject.keywordPlus | GLUTATHIONE | - |
dc.subject.keywordPlus | ADSORPTION | - |
dc.subject.keywordPlus | ADDITIVES | - |
dc.subject.keywordPlus | CHEMISTRY | - |
dc.subject.keywordPlus | ION | - |
dc.subject.keywordPlus | CL | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
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