Random walk deposition with relaxation

Abstract

We study a random walk deposition model with relaxation. In our model, the surface width w(t, L) increases as t(beta) in the early time and approaches L-alpha at a, later time, where L is the system size. We obtain alpha approximate to 2.16, i.e. larger than 1. The height correlation function G(r,t,L) has anomalous scaling behaviors with alpha(toc) approximate to 0.88, which is the local roughness exponent, Since alpha > 1 and alpha(toc) < 1, our model has an intrinsic anomalous roughening behavior.