Universal Route to Impart Orthogonality to Polymer Semiconductors for Sub-Micrometer Tandem Electronics
- Authors
- Park, H.W.; Choi, K.-Y.; Shin, J.; Kang, B.; Hwang, H.; Choi, S.; Song, A.; Kim, J.; Kweon, H.; Kim, S.; Chung, K.-B.; Kim, B.; Cho, K.; Kwon, S.-K.; Kim, Y.-H.; Kang, M.S.; Lee, H.; Kim, D.H.
- Issue Date
- Jul-2019
- Publisher
- Wiley-VCH Verlag
- Keywords
- orthogonal polymer semiconductor gel; photolithography; semi-interpenetrating diphasic polymer network; sequential solution processes; sub-micrometer tandem electronics
- Citation
- Advanced Materials, v.31, no.28, pp.1901400
- Journal Title
- Advanced Materials
- Volume
- 31
- Number
- 28
- Start Page
- 1901400
- URI
- http://scholarworks.bwise.kr/ssu/handle/2018.sw.ssu/34737
- DOI
- 10.1002/adma.201901400
- ISSN
- 0935-9648
- Abstract
- A universal method that enables utilization of conventional photolithography for processing a variety of polymer semiconductors is developed. The method relies on imparting chemical and physical orthogonality to a polymer film via formation of a semi-interpenetrating diphasic polymer network with a bridged polysilsesquioxane structure, which is termed an orthogonal polymer semiconductor gel. The synthesized gel films remain tolerant to various chemical and physical etching processes involved in photolithography, thereby facilitating fabrication of high-resolution patterns of polymer semiconductors. This method is utilized for fabricating tandem electronics, including pn-complementary inverter logic devices and pixelated polymer light-emitting diodes, which require deposition of multiple polymer semiconductors through solution processes. This novel and universal method is expected to significantly influence the development of advanced polymer electronics requiring sub-micrometer tandem structures. © 2019 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - College of Information Technology > ETC > 1. Journal Articles
![qrcode](https://api.qrserver.com/v1/create-qr-code/?size=55x55&data=https://scholarworks.bwise.kr/ssu/handle/2018.sw.ssu/34737)
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.