Directed self-assembly of block copolymers for next generation nanolithography
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Jeong, Seong-Jun | - |
dc.contributor.author | Kim, Ju Young | - |
dc.contributor.author | Kim, Bong Hoon | - |
dc.contributor.author | Moon, Hyoung-Seok | - |
dc.contributor.author | Kim, Sang Ouk | - |
dc.date.available | 2020-09-14T10:05:31Z | - |
dc.date.created | 2019-07-08 | - |
dc.date.issued | 2013-12 | - |
dc.identifier.issn | 1369-7021 | - |
dc.identifier.uri | http://scholarworks.bwise.kr/ssu/handle/2018.sw.ssu/39465 | - |
dc.description.abstract | Directed self-assembly of block copolymers has received a great deal of research attention as a promising nanolithography to complement the intrinsic limitations of conventional photolithography. In this review, we highlight the recent progress in the development of the directed self-assembly process for practical utilization in semiconductor applications. Various advanced directed self-assembly approaches are examined, in which block copolymer self-assembly is synergistically integrated with conventional photolithography, such as ArF lithography or I-line lithography, via either epitaxial self-assembly or the graphoepitaxy principle. We focus on the practical advantages anticipated from directed self-assembly integration, such as pattern density multiplication, feature size uniformity improvement, line edge roughness reduction, as well as cost reduction. Additionally, a direction for future research on directed self-assembly is suggested with diverse potential applications. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER SCI LTD | - |
dc.relation.isPartOf | MATERIALS TODAY | - |
dc.title | Directed self-assembly of block copolymers for next generation nanolithography | - |
dc.type | Article | - |
dc.identifier.doi | 10.1016/j.mattod.2013.11.002 | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | MATERIALS TODAY, v.16, no.12, pp.468 - 476 | - |
dc.description.journalClass | 1 | - |
dc.identifier.wosid | 000328640100015 | - |
dc.identifier.scopusid | 2-s2.0-84890392162 | - |
dc.citation.endPage | 476 | - |
dc.citation.number | 12 | - |
dc.citation.startPage | 468 | - |
dc.citation.title | MATERIALS TODAY | - |
dc.citation.volume | 16 | - |
dc.contributor.affiliatedAuthor | Kim, Bong Hoon | - |
dc.type.docType | Article | - |
dc.description.isOpenAccess | N | - |
dc.subject.keywordPlus | OPTICAL LITHOGRAPHY | - |
dc.subject.keywordPlus | SOFT GRAPHOEPITAXY | - |
dc.subject.keywordPlus | DIBLOCK COPOLYMER | - |
dc.subject.keywordPlus | SURFACE PATTERNS | - |
dc.subject.keywordPlus | SQUARE ARRAYS | - |
dc.subject.keywordPlus | LARGE-AREA | - |
dc.subject.keywordPlus | POLYSTYRENE | - |
dc.subject.keywordPlus | TEMPLATES | - |
dc.subject.keywordPlus | POLYMERS | - |
dc.subject.keywordPlus | PHOTORESIST | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
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