Ultralarge-area block copolymer lithography using self-assembly assisted photoresist pre-pattern
- Authors
- Jin, H.-M.; Jeong, S.-J.; Moon, H.-S.; Kim, B.H.; Kim, J.Y.; Yu, J.; Lee, S.; Lee, M.G.; Choi, H.; Kim, S.O.
- Issue Date
- Oct-2011
- Publisher
- IEEE
- Citation
- 2011 IEEE Nanotechnology Materials and Devices Conference, NMDC 2011, pp.527 - 533
- Journal Title
- 2011 IEEE Nanotechnology Materials and Devices Conference, NMDC 2011
- Start Page
- 527
- End Page
- 533
- URI
- http://scholarworks.bwise.kr/ssu/handle/2018.sw.ssu/39502
- DOI
- 10.1109/NMDC.2011.6155284
- ISSN
- 0000-0000
- Abstract
- These We accomplished truly scalable, low cost, arbitrarily large-area block copolymer lithography, synergistically integrating the two principles of graphoepitaxy and epitaxial self-assembly. Graphoepitaxy morphology composed of highly aligned lamellar block copolymer film that self-assembled within a disposable photoresist trench pattern was prepared by conventional I-line lithography and utilized as a chemical nanopatterning mask for the underlying substrate. After the block copolymer film and disposable photoresist layer were removed, the same lamellar block copolymer film was epitaxially assembled on the exposed chemically patterned substrate. Highly oriented lamellar morphology was attained without any trace of structure directing the photoresist pattern over an arbitrarily large area. © 2011 IEEE.
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - College of Engineering > ETC > 1. Journal Articles
![qrcode](https://api.qrserver.com/v1/create-qr-code/?size=55x55&data=https://scholarworks.bwise.kr/ssu/handle/2018.sw.ssu/39502)
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.