Surface Energy Modification by Spin-Cast, Large-Area Graphene Film for Block Copolymer Lithography
- Authors
- Kim, Bong Hoon; Kim, Ju Young; Jeong, Seong-Jun; Hwang, Jin Ok; Lee, Duck Hyun; Shin, Dong Ok; Choi, Sung-Yool; Kim, Sang Ouk
- Issue Date
- Sep-2010
- Publisher
- AMER CHEMICAL SOC
- Keywords
- block copolymer; self-assembly; graphene; nanolithography; surface energy modification
- Citation
- ACS NANO, v.4, no.9, pp.5464 - 5470
- Journal Title
- ACS NANO
- Volume
- 4
- Number
- 9
- Start Page
- 5464
- End Page
- 5470
- URI
- http://scholarworks.bwise.kr/ssu/handle/2018.sw.ssu/39513
- DOI
- 10.1021/nn101491g
- ISSN
- 1936-0851
- Abstract
- We demonstrate a surface energy modification method exploiting graphene film, Spin-cast, atomic layer thick, large-area reduced graphene film successfully played the role of surface energy modifier for arbitrary surfaces. The degree of reduction enabled the tuning of the surface energy. Sufficiently reduced graphene served as a neutral surface modifier to induce surface perpendicular lamellae or cylinders in a block copolymer nanotemplate. Our approach integrating large-area graphene film preparation with block copolymer lithography is potentially advantageous in creating semiconducting graphene nanoribbons and nanoporous graphene.
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Collections - College of Engineering > ETC > 1. Journal Articles
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