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Hierarchical self-assembly of block copolymers for lithography-free nanopatterning
- Authors
- Kim, Bong Hoon; Shin, Dong Ok; Jeong, Seong-Jun; Koo, Chong Min; Jeon, Sang Chul; Hwang, Wook Jung; Lee, Sumi; Lee, Moon Gyu; Kim, Sang Ouk
- Issue Date
- Jun-2008
- Publisher
- WILEY-V C H VERLAG GMBH
- Citation
- ADVANCED MATERIALS, v.20, no.12, pp.2303 - +
- Journal Title
- ADVANCED MATERIALS
- Volume
- 20
- Number
- 12
- Start Page
- 2303
- End Page
- +
- ISSN
- 0935-9648
- Abstract
- Hierarchical self-assembly of block copolymers has been achieved by two steps of sequential ordering processes, consisting of self-organized micropatterning from a dewetting block polymer solution and thermal annealing. The self-organized micropattern induces the spontaneous alignment of self-assembled lamellae (see figure), which is successfully applied for a lithography-free, ultra-large-scale nanopatterning.
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