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The synthesis of random brush for nanostructure of block copolymer

Authors
Kim, B.H.Koo, C.M.Shin, D.O.Jeong, S.J.Kim, S.O.
Issue Date
Mar-2007
Publisher
John Wiley & Sons Ltd.
Keywords
Block copolymer; Nanostructure; Polymer brush; Self-assembly; Thin film
Citation
Macromolecular Symposia, v.249-250, pp.303 - 306
Journal Title
Macromolecular Symposia
Volume
249-250
Start Page
303
End Page
306
URI
http://scholarworks.bwise.kr/ssu/handle/2018.sw.ssu/39534
DOI
10.1002/masy.200750349
ISSN
1022-1360
Abstract
Polymer brush has been synthesized via conventional free radical polymerization to use a surface active material on the silicon substrate. The synthesized polymer brushes were successfully grafted onto the silicon oxide substrate and the hydrophilic silicon oxide substrate has been changed into the more hydrophobic one. The synthesized poly(styrene-ran-methyl methacrylate) brush grafted silicon substrate could provide poly(styrene-block-methyl methacrylate) with neutral surface. Copyright © 2007 WILEY-VCH Verlag GmbH & Co. KGaA.
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