Neutral-layer-free directed self-assembly of block copolymer in trench using capillary force-induced meniscus
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Shin, Jin Yong | - |
dc.contributor.author | Lee, Bom | - |
dc.contributor.author | Lim, Heo Yeon | - |
dc.contributor.author | Kim, Simon | - |
dc.contributor.author | Jeong, Seong-Jun | - |
dc.date.available | 2021-03-04T00:40:29Z | - |
dc.date.created | 2021-03-04 | - |
dc.date.issued | 2021-01-22 | - |
dc.identifier.issn | 0957-4484 | - |
dc.identifier.uri | http://scholarworks.bwise.kr/ssu/handle/2018.sw.ssu/40354 | - |
dc.description.abstract | We propose trench-directed self-assembly (TDSA) of a block copolymer (BCP) driven by a capillary force-induced meniscus as a facile scalable nanolithography method. Unlike conventional directed self-assembly methods, TDSA enables the achievement of neutral surface-free vertical orientations of the BCP nanopatterns irrespective of the polarizability of the substrate, which may be, for example, a ceramic (SiO2) on Semiconductor (Si). In our demonstration of the proposed method, we generated various morphologies of the BCP nanopatterns by varying the trench width, and molecular weight of the BCP. The proposed TDSA method is potentially advantageous for the design of a process/device layout required for the development of an effective manufacturing process. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | IOP PUBLISHING LTD | - |
dc.relation.isPartOf | NANOTECHNOLOGY | - |
dc.title | Neutral-layer-free directed self-assembly of block copolymer in trench using capillary force-induced meniscus | - |
dc.type | Article | - |
dc.identifier.doi | 10.1088/1361-6528/abbbb3 | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | NANOTECHNOLOGY, v.32, no.4 | - |
dc.description.journalClass | 1 | - |
dc.identifier.wosid | 000584907900001 | - |
dc.identifier.scopusid | 2-s2.0-85095703903 | - |
dc.citation.number | 4 | - |
dc.citation.title | NANOTECHNOLOGY | - |
dc.citation.volume | 32 | - |
dc.contributor.affiliatedAuthor | Jeong, Seong-Jun | - |
dc.type.docType | Article | - |
dc.description.isOpenAccess | N | - |
dc.subject.keywordAuthor | nanolithography | - |
dc.subject.keywordAuthor | block copolymer | - |
dc.subject.keywordAuthor | directed self-assembly | - |
dc.subject.keywordAuthor | vertical orientation | - |
dc.subject.keywordAuthor | capillary force | - |
dc.subject.keywordPlus | THIN-FILMS | - |
dc.subject.keywordPlus | LITHOGRAPHY | - |
dc.subject.keywordPlus | GRAPHOEPITAXY | - |
dc.subject.keywordPlus | ARRAYS | - |
dc.subject.keywordPlus | HOLES | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
Soongsil University Library 369 Sangdo-Ro, Dongjak-Gu, Seoul, Korea (06978)02-820-0733
COPYRIGHT ⓒ SOONGSIL UNIVERSITY, ALL RIGHTS RESERVED.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.