Thermally induced self-assembly of poly(4-(tert-butyldimethylsiloxy)styrene-b-2-vinylpyridine) with extremely reduced roughness of patterns
DC Field | Value | Language |
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dc.contributor.author | Hur, Y.H. | - |
dc.contributor.author | Kang, B.-G. | - |
dc.date.accessioned | 2021-09-08T07:28:50Z | - |
dc.date.available | 2021-09-08T07:28:50Z | - |
dc.date.created | 2021-08-26 | - |
dc.date.issued | 2021-08-15 | - |
dc.identifier.issn | 0014-3057 | - |
dc.identifier.uri | http://scholarworks.bwise.kr/ssu/handle/2018.sw.ssu/41027 | - |
dc.description.abstract | Directed self-assembly (DSA) of block copolymers (BCPs) is among the best alternative methods for achieving traditional top-down lithography because BCPs can form well-ordered nanostructures, such as spheres, cylinders, gyroids, and lamellae, with a controlled domain size (d) of 10–50 nm. However, regarding the pattern quality, further development of BCPs to satisfy industrial demands is still necessary. Here, a well-defined BCP, poly(4-(tert-butyldimethylsiloxy)styrene-b-2-vinylpyridine) (P4BDSS-b-P2VP), was synthesized to investigate the relationship between the Flory-Huggins interaction parameter (χ) and the self-assembled pattern quality by comparing it with poly(styrene-b-4-(tert-butyldimethylsiloxy)styrene) (PS-b-P4BDSS). It was confirmed that the higher χ value of P4BDSS-b-P2VP (0.128 at 25 °C) than that of PS-b-P4BDSS (0.0525 at 25 °C) calculated based on small-angle X-ray scattering (SAXS) analysis and Leibler's mean field theory was beneficial to pattern quality in DSA. The line edge roughness (LER) and line width roughness (LWR) of P4BDSS-b-P2VP were 1.33 and 2.73 nm, respectively, which were lower than those of PS-b-P4BDSS (2.29 and 3.52 nm, respectively). © 2021 Elsevier Ltd | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | Elsevier Ltd | - |
dc.relation.isPartOf | European Polymer Journal | - |
dc.title | Thermally induced self-assembly of poly(4-(tert-butyldimethylsiloxy)styrene-b-2-vinylpyridine) with extremely reduced roughness of patterns | - |
dc.type | Article | - |
dc.identifier.doi | 10.1016/j.eurpolymj.2021.110653 | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | European Polymer Journal, v.157 | - |
dc.description.journalClass | 1 | - |
dc.identifier.wosid | 000693340300003 | - |
dc.identifier.scopusid | 2-s2.0-85111226893 | - |
dc.citation.title | European Polymer Journal | - |
dc.citation.volume | 157 | - |
dc.contributor.affiliatedAuthor | Kang, B.-G. | - |
dc.type.docType | Article | - |
dc.description.isOpenAccess | N | - |
dc.subject.keywordAuthor | Block copolymer | - |
dc.subject.keywordAuthor | Directed self-assembly | - |
dc.subject.keywordAuthor | Flory-Huggins interaction parameter | - |
dc.subject.keywordAuthor | Line edge roughness | - |
dc.subject.keywordAuthor | Line width roughness | - |
dc.subject.keywordPlus | Mean field theory | - |
dc.subject.keywordPlus | Quality control | - |
dc.subject.keywordPlus | Roughness measurement | - |
dc.subject.keywordPlus | Self assembly | - |
dc.subject.keywordPlus | Styrene | - |
dc.subject.keywordPlus | Surface roughness | - |
dc.subject.keywordPlus | X ray scattering | - |
dc.subject.keywordPlus | 2-vinylpyridine | - |
dc.subject.keywordPlus | Block co polymers | - |
dc.subject.keywordPlus | Directed self-assembly | - |
dc.subject.keywordPlus | Flory-Huggins interaction parameter | - |
dc.subject.keywordPlus | Line Edge Roughness | - |
dc.subject.keywordPlus | Linewidth roughness | - |
dc.subject.keywordPlus | Ordered nanostructures | - |
dc.subject.keywordPlus | Pattern quality | - |
dc.subject.keywordPlus | Thermally induced | - |
dc.subject.keywordPlus | Topdown | - |
dc.subject.keywordPlus | Block copolymers | - |
dc.relation.journalResearchArea | Polymer Science | - |
dc.relation.journalWebOfScienceCategory | Polymer Science | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
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