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Low-Voltage 2D Material Field-Effect Transistors Enabled by Ion Gel Capacitive Coupling

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dc.contributor.authorChoi, Yongsuk-
dc.contributor.authorKang, Junmo-
dc.contributor.authorJariwala, Deep-
dc.contributor.authorWells, Spencer A.-
dc.contributor.authorKang, Moon Sung-
dc.contributor.authorMarks, Tobin J.-
dc.contributor.authorHersam, Mark C.-
dc.contributor.authorCho, Jeong Ho-
dc.date.available2018-05-08T14:41:44Z-
dc.date.created2018-04-17-
dc.date.issued2017-05-09-
dc.identifier.issn0897-4756-
dc.identifier.urihttp://scholarworks.bwise.kr/ssu/handle/2018.sw.ssu/6371-
dc.description.abstractCapacitive coupling between an overlying ion gel electrolyte and an underlying oxide thin film is utilized to substantially suppress the operating voltage of field-effect transistors (FETs) based on two-dimensional (2D) transition metal dichalcogenides and black phosphorus. The coupling of the layers is achieved following device fabrication by laminating an ion gel layer over an oxide-gated 2D FET through solution-casting methods. While the original pristine 2D FET requires tens of volts for gating through the oxide layer, the laminated ion gel layer reduces the operating voltage to below 4 V even when the same underlying substrate is used as the back gate electrode. Moreover, this capacitive coupling approach allows low-voltage operation without compromising the off-current level, which often occurs when ion gel electrolytes are directly employed as the gate dielectric material. This approach can likely be generalized to a wide variety of thin-film FETs as a postfabrication method for reducing operating voltages and power consumption.-
dc.publisherAMER CHEMICAL SOC-
dc.relation.isPartOfCHEMISTRY OF MATERIALS-
dc.subjectTRANSITION-METAL DICHALCOGENIDES-
dc.subjectTHIN-FILM TRANSISTORS-
dc.subjectSINGLE-LAYER MOS2-
dc.subjectBLACK PHOSPHORUS-
dc.subjectGRAPHENE TRANSISTORS-
dc.subjectGATE-
dc.subjectMOBILITY-
dc.subjectDIELECTRICS-
dc.subjectTRANSPORT-
dc.subjectCONTACTS-
dc.titleLow-Voltage 2D Material Field-Effect Transistors Enabled by Ion Gel Capacitive Coupling-
dc.typeArticle-
dc.identifier.doi10.1021/acs.chemmater.7b00573-
dc.type.rimsART-
dc.identifier.bibliographicCitationCHEMISTRY OF MATERIALS, v.29, no.9, pp.4008 - 4013-
dc.description.journalClass1-
dc.identifier.wosid000401221700022-
dc.identifier.scopusid2-s2.0-85019066596-
dc.citation.endPage4013-
dc.citation.number9-
dc.citation.startPage4008-
dc.citation.titleCHEMISTRY OF MATERIALS-
dc.citation.volume29-
dc.contributor.affiliatedAuthorKang, Moon Sung-
dc.type.docTypeArticle-
dc.subject.keywordPlusTRANSITION-METAL DICHALCOGENIDES-
dc.subject.keywordPlusTHIN-FILM TRANSISTORS-
dc.subject.keywordPlusSINGLE-LAYER MOS2-
dc.subject.keywordPlusBLACK PHOSPHORUS-
dc.subject.keywordPlusGRAPHENE TRANSISTORS-
dc.subject.keywordPlusGATE-
dc.subject.keywordPlusMOBILITY-
dc.subject.keywordPlusDIELECTRICS-
dc.subject.keywordPlusTRANSPORT-
dc.subject.keywordPlusCONTACTS-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
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