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Large-Area CVD-Grown Sub-2 V ReS2 Transistors and Logic Gates

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dc.contributor.authorDathbun, Ajjiporn-
dc.contributor.authorKim, Youngchan-
dc.contributor.authorKim, Seongchan-
dc.contributor.authorYoo, Youngjae-
dc.contributor.authorKang, Moon Sung-
dc.contributor.authorLee, Changgu-
dc.contributor.authorCho, Jeong Ho-
dc.date.available2018-05-08T14:43:47Z-
dc.date.created2018-04-17-
dc.date.issued2017-05-
dc.identifier.issn1530-6984-
dc.identifier.urihttp://scholarworks.bwise.kr/ssu/handle/2018.sw.ssu/6390-
dc.description.abstractWe demonstrated the fabrication of large-area ReS2 transistors and logic gates composed of a chemical vapor deposition (CVD)-grown multilayer ReS2 semiconductor, channel and graphene electrodes. Single-layer graphene was used as the source/drain and coplanar gate electrodes. Anion gel with an, ultrahigh capacitance effectively,gated the ReS2 channel at a low voltage, below 2 V, through a coplanar gate: The.contact resistance of the ion gel-gated ReS2 transistors with graphene electrodes decreased dramatically compared with the SiO2-devices prepared with Cr electrodes, The resulting transisiors exhibited good device performance, including a maximum electron mobility of 0:9 cm(2)/(V s) and an on/off current ratio exceeding 10(4). NMOS logic devices, such as NOT, NAND, and NOR, gates, were assembled using the resulting transistors as a proof of concept demonstration of the applicability of the devices. to complex logic circuits. The large-area synthesis of ReS2 semiconductors and graphene electrodes and their applications in logic devices open up new opportunities for realizing future flexible electronics based on 2D nanornaterials.-
dc.publisherAMER CHEMICAL SOC-
dc.relation.isPartOfNANO LETTERS-
dc.subjectFIELD-EFFECT TRANSISTORS-
dc.subjectTRANSITION-METAL DICHALCOGENIDES-
dc.subjectCHEMICAL-VAPOR-DEPOSITION-
dc.subjectMOLYBDENUM-DISULFIDE-
dc.subjectCOMPLEMENTARY INVERTERS-
dc.subjectGRAPHENE TRANSISTORS-
dc.subjectGRAIN-BOUNDARIES-
dc.subjectMOS2 TRANSISTORS-
dc.subjectHIGH-FREQUENCY-
dc.subjectLAYERED RES2-
dc.titleLarge-Area CVD-Grown Sub-2 V ReS2 Transistors and Logic Gates-
dc.typeArticle-
dc.identifier.doi10.1021/acs.nanolett.7b00315-
dc.type.rimsART-
dc.identifier.bibliographicCitationNANO LETTERS, v.17, no.5, pp.2999 - 3005-
dc.description.journalClass1-
dc.identifier.wosid000401307300038-
dc.identifier.scopusid2-s2.0-85019227565-
dc.citation.endPage3005-
dc.citation.number5-
dc.citation.startPage2999-
dc.citation.titleNANO LETTERS-
dc.citation.volume17-
dc.contributor.affiliatedAuthorKang, Moon Sung-
dc.type.docTypeArticle-
dc.subject.keywordAuthorReS2-
dc.subject.keywordAuthorchemical vapor deposition (CVD)-
dc.subject.keywordAuthortransistor-
dc.subject.keywordAuthorlarge area-
dc.subject.keywordAuthorlogic gate-
dc.subject.keywordPlusFIELD-EFFECT TRANSISTORS-
dc.subject.keywordPlusTRANSITION-METAL DICHALCOGENIDES-
dc.subject.keywordPlusCHEMICAL-VAPOR-DEPOSITION-
dc.subject.keywordPlusMOLYBDENUM-DISULFIDE-
dc.subject.keywordPlusCOMPLEMENTARY INVERTERS-
dc.subject.keywordPlusGRAPHENE TRANSISTORS-
dc.subject.keywordPlusGRAIN-BOUNDARIES-
dc.subject.keywordPlusMOS2 TRANSISTORS-
dc.subject.keywordPlusHIGH-FREQUENCY-
dc.subject.keywordPlusLAYERED RES2-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
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