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Degradation of Bis(3-sulfopropyl) Disulfide and Its Influence on Copper Electrodeposition for Feature Filling

Authors
Choe, SeunghoeKim, Myung JunKim, Hoe ChulCho, Sung KiAhn, Sang HyunKim, Soo-KilKim, Jae Jeong
Issue Date
Dec-2013
Publisher
ELECTROCHEMICAL SOC INC
Citation
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.160, no.12, pp D3179 - D3185
Journal Title
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume
160
Number
12
Start Page
D3179
End Page
D3185
URI
https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/15114
DOI
10.1149/2.032312jes
ISSN
0013-4651
1945-7111
Abstract
The degradation of bis(3-sulfopropyl) disulfide (SPS) during Cu electrodeposition and the influence of its decomposition products on the Cu film properties are investigated. SPS decomposes into 3-mercapto-1-propane sulfonic acid (MPSA) and 1,3-propane disulfonic acid (PDS) by dissociation of the disulfide bond and oxidation reactions. The MPSA seems to recombine to form SPS through a reaction with cupric ions, whereas the PDS accumulates in the plating solution without any further reactions. It was found that the net conversion from SPS to PDS reduced the acceleration effect and resulted in the deterioration of Cu feature filling. The final decomposition product, PDS, caused no remarkable changes in either the electrochemical behavior or the film properties. The deterioration in feature filling by degradation of SPS is mainly associated with the decrease in SPS concentration by decomposition and incorporation. (C) 2013 The Electrochemical Society. All rights reserved.
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공과대학 (화학공학과)
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