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Optical Characteristics and Nanoscale Energy Transport in Thin Film Structures Irradiated by Nanosecond-to-Femtosecond Lasers

Authors
Kang, KwanguLee, Seong HyukRyou, Hong Sun
Issue Date
Nov-2008
Publisher
JAPAN INST METALS
Keywords
femtosecond laser; energy transport; wave interference; silicon thin films; carrier temperature; lattice temperature
Citation
MATERIALS TRANSACTIONS, v.49, no.11, pp 2521 - 2527
Pages
7
Journal Title
MATERIALS TRANSACTIONS
Volume
49
Number
11
Start Page
2521
End Page
2527
URI
https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/23572
DOI
10.2320/matertrans.MB200820
ISSN
1345-9678
1347-5320
Abstract
Extensive numerical simulations are rigorously conducted for conductive and radiative heat transfer characteristics in thin silicon Structures irradiated by nano-to-femtosecond pulsed lasers. The two-temperature model is used to calculate the carrier and lattice temperatures, respectively. The wave interference effects on reflectivity and absorption are considered by using- the thin film optics and the electromagnetic theory, The radiation property of silicon is expressed in terms of lattice temperature and carrier density. The reflectivity of thin film structure exhibits different patterns with variation of laser pulse durations. In femtosecond laser irradiation, the energy transfer between carriers and lattice phonons mostly takes place after laser irradiation is over and then it rapidly heats the ions to much higher temperatures, compared to the long pulse cases. For nanosecond pulse lasers, the carrier and lattice temperature distributions do not show wavy patterns, whereas for subpicosecond Pulse lasers. the spatial carrier and lattice temperature distributions appear to be periodic in space because of shorter pulse duration than diffusion time. [doi:10.2320/matertrans.MB200820]
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